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Standing Wave of Capacitively Coupled Plasma(CCP) Chamber (CUDA) | samadii/em

4 Lượt xem03/01/2024

⚡🧲A capacitively coupled plasma (CCP) is a type of plasma that is generated by applying radio frequency (RF) power to electrodes, creating an electric field between them. When this electric field is strong enough, it ionizes the gas between the electrodes, forming a plasma. In the context of CCP, a standing wave refers to a specific pattern of electric fields within the plasma chamber. ༄〰 The term "standing wave" generally implies that there are regions of constructive and destructive interference in the electric field, leading to a stable pattern of peaks and troughs. This pattern can be visualized as a wave that appears to be standing still, hence the term "standing wave." 📋Understanding the standing wave pattern is essential for optimizing the performance of CCP systems, especially in applications such as plasma processing, where uniformity and stability of the plasma are crucial. 📢 For more information on samadii/em software, contact us at support@metariver.kr #simulation #simulationsoftware #electromagnetic #electromagnetics #CCP #couplingplasma #plasmachamber #plasma #rf #joule #current #magneticfield #eddycurrent #FEM #rf #gpu #electromagnetics #electricfield #gausslaw #electriccurrent #quasistatics #antenna #multiphysics #semiconductor #semiconductorindustry #electronics #finiteelementanalysis #semiconductor #cuda #electromechanical #쿠다 #메타리버테크놀러지 #시뮬레이션 #사마디
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